The Physics of Submicron Lithography W. Vogel & M. Büttner GmbH Zeit und Aktivität zu investieren

Zeit und Aktivität zu investieren

Das Sachbuch ist das erste

An inductive approach was chosen to achieve the aims of this thesis (Gill & Johnson)

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The Physics of Submicron Lithography W. Vogel & M. Büttner GmbH Zeit und Aktivität zu investierenThis book is devoted to the physics of electron beam, ion beam, optical, and x ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the